
They want the mask twice as wide
On 7 and 8 September 2026, ASML and TSMC opened an industry push to 12-inch photomasks for High NA EUV. Samsung and Intel Foundry published matching notes the same SPIE week in Monterey. The pilot-line target is 2031; production readiness 2033. Intel says it has already put more than one million wafers through High NA on today's 6-inch masks.











